PATTERN FORMATION PROCESS BY ION ETCHING
نویسندگان
چکیده
منابع مشابه
Novel two-step etching process for ion tracks in polyimide
Polyimide is of great technical importance because of its excellent material properties (including chemical inertness and radiation resistance) which are maintained even at low and at high temperatures. When thin polyimide foils are irradiated with energetic heavy ions, long nanometric tracks are formed. Under suitable conditions, the damaged material along these tracks is dissolved and develop...
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ژورنال
عنوان ژورنال: Journal of the Japan Society of Precision Engineering
سال: 1976
ISSN: 0374-3543
DOI: 10.2493/jjspe1933.42.493